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Max Schoendorff (1934-2012) : l’atelier, laboratoire de l’œuvre / Max Schoendorff’s Workshop as a Creative LaboratoryZeraffa, Martine 07 December 2018 (has links)
L’œuvre plurielle de Max Schoendorff (1934-2012) est approchée au regard du lieu de sa création : l’atelier de l’artiste. Ce lieu foisonnant de matériel, d’images, d’objets et de livres est emblématique de sa pensée. Il livre les traces de ses multiples activités. La monographie de l’artiste est fondée sur l’archéologie de ce laboratoire. Formé à la littérature classique,imprégné de culture allemande, rompu à la transgression, Schoendorff s’engage dès le milieu des années 1950 à Lyon aux côtés de Roger Planchon et d’un petit groupe d’intellectuels et de créateurs. Il s’affirme en tant qu’initiateur d’une décentralisation de la culture. Il trouve ensuite dans la peinture matière à se forger son propre langage, nourri de l’imaginairesurréaliste, de Max Ernst, des tourments métamorphiques d’une matière essentiellement organique. Sa pensée singulière s’exprime dans une œuvre protéiforme qui traverse les champs de la peinture, de la gravure, du livre et de la scénographie de spectacle. Libertaire et utopiste quant à ses convictions sociales et politiques, il s’engage en fondant la MAPRA, Maison des arts plastiques Rhône-Alpes, et l’URDLA, Centre international estampe et livre à Villeurbanne. / The study of MS’s multivocal work is carried out through an on-site investigation of his workshop. The place, which reflects his philosophy, is full of materials, images, objects, and books. It bears testimony to his numerous activities. Indeed writing a monograph of the artist amounts to performing archeological fieldwork and excavation in his studio. Schoendorff studied classical literature, was well-versed on the subject of German culture, and enjoyed transgressing boundaries. As early as 1950, he was labelled as a committed artist together with RP and a small group of intellectuals and creators/designers from Lyon. Heconsidered himself as the initiator of cultural decentralization. He later devoted himself to painting and managed to create his own artistic language based on the surrealist imaginary world, Max Ernst’s production, and the metamorphic alteration of predominantly organic matter. His personal conception of art is expressed in his protean works which include paintings, engravings, books, and spectatorial scenography. A socio-political libertarian and utopian, he founded the MAPRA (Maison des arts plastiques Rhône-Alpes), the R-A Fine Arts Agency and the URDLA, the International Book and Lithography Centre (Centreinternational estampe et livre) in Villeurbanne.
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Optimisation de l'épitaxie VLS du semiconducteur 4H-SiC : Réalisation de dopages localisés dans 4H-SiC par épitaxie VLS et application aux composants de puissance SiC / Optimization of the VLS epitaxy of 4H-SiC semiconductor : Development of localized doping in 4H-SiC by VLS epitaxy and applications to SiC power devicesSejil, Selsabil 29 September 2017 (has links)
L'objectif du projet VELSIC a été de démontrer la faisabilité de jonctions p+/n- profondes dans le semiconducteur 4H-SiC, de haute qualité électrique, comprenant une zone p++ réalisée par un procédé original d'épitaxie localisée à basse température (1100 – 1200°C), en configuration VLS (Vapeur - Liquide - Solide). Cette technique innovante de dopage par épitaxie utilise le substrat de SiC mono cristallin comme un germe de croissance sur lequel un empilement enterré de Al - Si est porté à fusion pour constituer un bain liquide, lequel est alimenté en carbone par la phase gazeuse. Cette méthode se positionne comme une alternative avantageuse à l'implantation ionique, actuellement utilisée par tous les fabricants de composants en SiC, mais qui présente des limitations problématiques encore non résolues à ce jour. Les travaux de thèse ont exploré toutes les facettes du processus complet de fabrication de diodes de test, avec une attention particulière portée sur l'optimisation de la gravure de cuvettes dans le substrat SiC. Le cœur des travaux a été concentré sur l'optimisation de l'épitaxie VLS localisée. L'étude a confirmé la nécessité de limiter la vitesse de croissance vers 1 µm/h pour conserver une bonne cristallinité du matériau épitaxié. Elle a également mis en évidence l'action directe du champ électromagnétique radiofréquence sur la phase liquide, conduisant à une très forte influence du diamètre des cuvettes gravées sur l'épaisseur du SiC déposé. Un remplissage quasiment complet des cuvettes de 1 µm de profondeur à très fort dopage p++ a été démontré. À partir des couches VLS optimisées, des démonstrateurs de types diodes p+/n- ont été fabriqués. Sur les meilleurs échantillons, sans passivation ni protection périphérique, des tensions de seuil en régime direct (entre 2,5 et 3 V) ont, pour la première fois, été mesurées, sans recourir à un recuit haute température après épitaxie. Elles correspondent aux valeurs attendues pour une vraie jonction p-n sur 4H-SiC. Des densités de courant de plusieurs kA/cm2 ont également pu être injectées pour des tensions situées autour de 5 - 6 V. En régime de polarisation inverse, aucun claquage n'est observé jusqu'à 400 V et les densités de courant de fuite à faible champ électrique dans la gamme 10-100 nA/cm2 ont été mesurées. Toutes ces avancées si situent au niveau de l'état de l'art pour des composants SiC aussi simples, toutes techniques de dopage confondues / The objective of the VELSIC project has been to demonstrate the feasibility of 1 µm deep p+/n- junctions with high electrical quality in 4H-SiC semiconductor, in which the p++ zone is implemented by an original low-temperature localized epitaxy process ( 1100 - 1200 °C ), performed in the VLS (Vapor - Liquid - Solid) configuration. This innovative epitaxy doping technique uses the monocrystalline SiC substrate as a crystal growth seed. On the substrate (0001-Si) surface, buried patterns of Al - Si stack are fused to form liquid islands which are fed with carbon by C3H8 in the gas phase. This method is investigated as a possible higher performance alternative to the ion implantation process, currently used by all manufacturers of SiC devices, but which still experiences problematic limitations that are yet unresolved to date. Although the main focus of the study has been set on the optimization of localized VLS epitaxy, our works have explored and optimized all the facets of the complete process of test diodes, from the etching of patterns in the SiC substrate up to the electrical I - V characterization of true pn diodes with ohmic contacts on both sides.Our results have confirmed the need to limit the growth rate down to 1 µm/h to maintain good crystallinity of the epitaxial material. It has also highlighted the direct action of the radiofrequency electromagnetic field on the liquid phase, leading to a very strong influence of the diameter of the etched patterns on the thickness of the deposited SiC. A nearly complete filling of the 1 µm deep trenches with very high p++ doping has been demonstrated. Using optimized VLS growth parameters, p+/n- diode demonstrators have been processed and tested. On the best samples, without passivation or peripheral protection, high direct-current threshold voltages, between 2.5 and 3 V, were measured for the first time without any high-temperature annealing after epitaxy. These threshold voltage values correspond to the expected values for a true p-n junction on 4H-SiC. Current densities of several kA/cm2 have also been injected at voltages around 5 - 6 V. Under reverse bias conditions, no breakdown is observed up to 400 V and low leakage current densities at low electric field, in the range 10 - 100 nA/cm2, have been measured. All these advances align with or exceed state-of-the-art results for such simple SiC devices, obtained using any doping technique
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Analyse d'une interface adhérente dentine/titane en fonction de différents matériaux d'assemblage / Study of a dentin adhesive / titanium interface mediated by different resin luting cementSchittly, Estelle 18 April 2016 (has links)
Le fil directeur durant cette période de recherche a été l’étude d’une interface dentine/titane assemblée par collage. L’objectif était d’optimiser et de simplifier des étapes du protocole d’assemblage, d’améliorer et d’étudier les performances de l’interface adhérente. Dans ce travail, les interfaces ont été testées in vitro par cisaillement.Cette étude a comporté trois volets :Le but de la première étude a été d’évaluer un assemblage par ciment verre ionomère (CVI), le Fuji Plus®, appliqué en association avec des adhésifs auto-mordançants sur la dentine. Trois des combinaisons « système auto-mordançant/Fuji Plus® » ont été appliquées et les résultats obtenus montrent des améliorations significatives entre 9% et 44% par rapport aux valeurs obtenues sur des éprouvettes de témoin.Le second volet expérimental a eu pour objectif de tester la compatibilité entre cinq systèmes adhésifs auto-mordançants (SAM) et deux composites d’assemblage (CA). Les SAM1 se sont révélés totalement incompatibles avec les CA chémopolymérisés ou duals. Inversement, les SAM2 étaient compatibles avec des CA chémopolymérisants ou duals. Une corrélation positive a été trouvée entre le pH des SAM ou les résines testées et les données de cisaillement.La dernière étude a été dédiée à l’évaluation de l'effet du stockage dans l’eau sur la résistance à la flexion (σf) et sur la résistance au cisaillement (RC) d’une interface dentine/titane assemblée par quatre résines adhésives auto-mordançantes (MRAM). Cette étude a montré que le stockage dans l'eau durant 60 jours a affecté négativement la résistance à la flexion de certains matériaux. L'adhésion dentine/titane offerte par Rely X® et G-Cem® était significativement plus élevée que celle de Maxcem® et SmartCem2®. / The aim of this work was to study a bonding dentin/titanium interface. The objective was to optimize and simplify the steps of the bonding protocol, improve and know well the performance of the adhesive interface. In this work, all interfaces have been tested in vitro by shearing.This study included three parts :The purpose of the first study was to evaluate an assemblage by glass ionomer cement (GIC), the Fuji plus®, applied in combination with self-etch bonding system on dentin. Three combinations "system self-etching / Fuji Plus®" were applied and the results obtained by test showed significant improvements from 9% to 44% higher than the values obtained on control specimens.The second experimental part was designed to test the compatibility between five self-etch bonding systems (SEBS) and two resin luting cements (RLC). Significant differences of bond strength in shear were observed according to both the curing mode of the RLC and the adhesive. The SEBS1 proved totally incompatible with chemical or dual cured RLC. Conversely, two-steps SEBS were compatible with RLC chemical/dual cured RLC. A positive correlation was found between the pH of the SEBS or the tested resins and the shear data.The latest study was devoted to evaluate the effect of the storage condition on flexural strength (σf) and shear bond strength (SBS) of a dentin/titanium interface assembled by four self-etch adhesive resin (SEARC). This study showed that the storage in water for 60 days has negatively affected the bending resistance of certain materials. The dentin/titanium adherence offered by Rely X® and G-Cem® was significantly higher than that of Maxcem® and SmartCem2®.
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Fatigue of Ti-6Al-4V thin parts made by electron beam melting / Propriétés en fatigue d'éprouvettes fines élaborées par fabrication additivePersenot, Théo 11 December 2018 (has links)
De nos jours, il est crucial pour les industries de réduire leur consommation énergétique. Pour les industries du transport, cela peut se faire par le biais de l’allègement des pièces de structure. Dans ce contexte, les structures cellulaires représentent une des solutions les plus prometteuses. Grâce au développement de la fabrication additive, l’élaboration de telles géométries complexes n’est plus un frein à leur utilisation. Néanmoins, cette dernière restera limitée tant que les propriétés mécaniques – et plus particulièrement la résistance en fatigue pour les pièces aéronautiques – ne seront pas maîtrisées. Ce travail de thèse a pour objectif de déterminer les mécanismes qui gouvernent le comportement en fatigue de ces structures cellulaires. Pour cela, le travail s’est focalisé sur l’élement unitaire les constituant : la poutre. Des éprouvettes minces représentatives de la poutre ont été élaborées par Electron Beam Melting puis caractérisées à l’état brut de fabrication à l’aide de différentes techniques (tomographie aux rayons X, microscopie optique et électronique, …). Leurs propriétés statique et cyclique en traction ont ensuite été évaluées. L’état de surface et en particulier les défauts d’entaille ont été identifiés comme responsable de la perte de résistance. L’impact de ces défauts sur la résistance en fatigue a été prédit avec succès par le biais de diagrammes de Kitagawa. L’impact de l’orientation de fabrication a également été observé et prédit. Différents post-traitements ont ensuite été utilisés afin d’améliorer ces propriétés. Le polissage chimique et le grenaillage ultrasonique ont réduit de manière significative la criticité des défauts de surface ce qui a grandement amélioré les propriétés mécaniques des éprouvettes, jusqu’à se rapprocher de celles obtenues après usinage. Par ailleurs, la compression isostatique à chaud a provoqué la fermeture de l’entièreté des défauts internes ainsi qu’un grossissement de la microstructure. Ce dernier point permet une amélioration supplémentaire de la performance en fatigue une fois combiné avec un traitement de surface. Enfin, une méthode permettant de détecter automatiquement tous les défauts d’entailles et de déterminer leur criticité et leur influence sur la résistance en fatigue a été proposée et discutée. Elle a ensuite été appliquée avec succès aux échantillons attaqués chimiquement mais des modifications demeurent nécessaire pour l’appliquer à d’autres états de surface. / Nowadays, reducing the energy consumption is crucial for most of the industries. For transportation industries, it can be achieved through weight reduction. In this context, cellular structures turn out to be one of the most efficient solution. Thanks to the development of additive manufacturing, producing such complex geometries is no longer an issue. However, their use will remain limited as long as their fatigue performances are not known. This PhD work aimed at understanding the mechanisms that govern the fatigue behaviour of such cellular structures. It was first decided to focus on their unitary element, i.e. a single strut. Single struts samples were manufactured by Electron Beam Melting and then characterized in as-built conditions using different experimental techniques (X-ray tomography, optical and electron microscopy, etc.). Their static and cyclic tensile properties were then evaluated. The rough surface and in particular notch-like defects were found to be responsible for the knockdown of the mechanical properties. Regarding the fatigue resistance, their detrimental impact was predicted using Kitagawa diagrams. It also enabled to explain the impact of the build orientation. Different post-treatments were used in order to improve these mechanical properties. Chemical etching and ultrasonic shot peening (USP) significantly reduced the severity of surface defects of as-built thin struts and thus increased their mechanical properties. After USP, the fatigue properties of machined samples were almost matched. Hot Isostatic Pressing lead to the closure of all internal defects and to the coarsening of the microstructure. When combined with one of the surface treatments, the fatigue properties were further improved. Finally, a method enabling to systematically and automatically extract from the surface the most critical defects and quantitatively analyze their influence on fatigue life was proposed and discussed. It was successfully applied to chemical etched samples but improvements are mandatory for other surface conditions.
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Ionic Liquid-Mediated Sol-Gel Sorbents for Capillary Microextraction and Challenges in Glass MicrofabricationShearrow, Anne M 18 May 2009 (has links)
Three ionic liquids (ILs), trihexyltetradecylphosphonium tetrafluoroborate (TTPT), N-butyl-4-methylpyridinium tetrafluoroborate (BMPT), and 1-methyl-3- octylimidazolium tetrafluoroborate (MOIC), were utilized to prepare sol- gel sorbent coatings. Non-polar polydimethylsiloxane (PDMS) and polar poly(ethylene glycol) (PEG), poly(tetrahydrofuran) (PolyTHF) and bis[(3-methyldimethoxy-silyl)propyl] polypropylene oxide (BMPO) polymers were employed to develop novel ionic liquidmediated sol- gel hybrid organic- inorganic sorbents. The novel sorbents were first tested as coatings for capillary microextraction off-line hyphenated to gas chromatography. To gain an understanding of the role of the ionic liquids in the sol-gel process, the preconcentration abilities of these novel coatings were investigated for several classes of compounds utilizing CME-GC. This was accomplished by comparing GC peak areas of a series of analytes extracted on the ionic liquid mediated sol-gel CME coatings with that of analogous peak areas obtained on sol- gel coatings prepared without the ionic liquid. The morphology of these coatings was compared using scanning electron microscopy (SEM) imaging data. Overall, the ionic liquid-mediated sol- gel coatings had more porous morphologies than the sol-gel coatings prepared without ionic liquid. The PDMS andBMPO sol-gel coatings prepared with ionic liquid in the sol solution provided enhanced extraction sensitivity reflected in higher preconcentration effects and lower detection limits than the sol- gel coatings prepared without the ionic liquid. The polar IL-mediated BMPO sol- gel sorbent was further investigated by exploring the extraction profile and thermal stability of these coatings. A further application of ionic liquid-mediated sol-gel sorbents could be as stationary phases in a microchip-based separation system. Towards this goal, microfluidic channels were fabricated in glass substrates using microelectromechanical engineering. Spiral and serpentine channels were etched in Pyrex and fused silica wafers using wet and deep reactive ion etching (DRIE) techniques. Microfabrication protocols such as the use of hard mask and etching times were investigated for both techniques. DRIE produced microfluidic channels that had an etch quality that was superior to wet etched channels. Thus, the ultimate microchip-based separation system should by fabricated using DRIE.
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Monolithic separation media synthesized in capillaries and their applications for molecularly imprinted networksCourtois, Julien January 2006 (has links)
<p>The thesis describes the synthesis of chromatographic media using several different approaches, their characterizations and applications in liquid chromatography. The steps to achieve a separation column for a specific analyte are presented. The main focus of the study was the design of novel molecularly imprinted polymers.</p><p>Attachment of monolithic polymeric substrates to the walls of fused silica capillaries was studied in Paper I. With a broad literature survey, a set of common methods were tested by four techniques and ranked by their ability to improve anchoring of polymers. The best procedure was thus used for all further studies.</p><p>Synthesis of monoliths in capillary columns was studied in Paper II. With the goal of separating proteins without denaturation, various monoliths were polymerized in situ using a set of common monomers and cross-linkers mixed with poly(ethylene glycol) as porogen. The resulting network was expected to present “protein-friendly pores”. Chemometrics were used to find and describe a set of co-porogens added to the polymerization cocktails in order to get good porosity and flow-through properties.</p><p>Assessment of the macroporous structure of a monolith was described in Paper III. An alternative method to mercury intrusion porosimetry was proposed. The capillaries were embedded in a stained resin and observed under transmission electron microscope. Images were then computed to determine the pore sizes.</p><p>Synthesis of molecularly imprinted polymers grafted to a core mono-lith in a capillary was described in Paper IV. The resulting material, imprinted with local anaesthetics, was tested for its chromatographic performance. Similar imprinted polymers were characterized by microcalorimetry in Paper V. Finally, imprinted monoliths were also synthesized in a glass tube and further introduced in a NMR rotor to describe the interactions between stationary phase and template in Paper VI.</p>
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Advanced methods for GLAD thin filmsKupsta, Martin 06 1900 (has links)
Thin films are produced from layers of materials ranging from nanometres to micrometres in height. They are increasingly common and are being used in integrated circuit design, optical coatings, protective coatings, and environmental sensing. Thin films can be fabricated using a variety of methods involving chemical reactions or physical transport of matter.
Glancing angle deposition (GLAD) thin films are produced using physical vapour deposition techniques under high vacuum conditions where exploitation of the geometric conditions between the source and the substrate causes enhanced atomic self shadowing to produce structured thin films. This work deals with the modification of these films, emph{in situ} by altering growing conditions through substrate temperatures control, or post-deposition through reactive ion etching (RIE).
The first part of the thesis deals with the modification of TiO$_2$ GLAD humidity sensors using RIE with CF$_4$. The data presented demonstrates improved response times to step changes in humidity. Characterization revealed response times of better then 50~ms (instrument-limited measurement). An etch recipe for complete removal of TiO$_2$ was also demonstrated with shadow masking to transfer patterns into GLAD films.
The subsequent chapter focuses on modification of thin film growth conditions by increasing adatom mobility. A radiative heating system was designed and implemented with the ability to achieve chuck temperatures of 400$^circ$C. Capping layers on top of GLAD films were grown to demonstrate effects of emph{in situ} heating, and a quantitative analysis of crack reduction with increased temperatures is presented. Lithographic pattern transfer onto a capped GLAD film was demonstrated.
Opposite to the goal of the preceding chapter, the focus of the final experimental chapter was to limit adatom mobility. A LN$_2$-based cooling system was designed and implemented for the purpose of studying the growth
by GLAD of lower melting point materials, which under regular growth conditions do not form well-defined structures. Chuck temperatures of $-60$$^circ$C can be achieved during deposition while still allowing substrate rotation. The growth of helical copper films was used to demonstrate the effects of emph{in situ} substrate cooling. / Micro-Electro-Mechanical Systems (MEMS) and Nanotechnology
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Highly selective mesoporous sorbents for mercury removal from industrial wastewaterGodongwana, Ziboneni Governor January 2011 (has links)
The results of this study show that novel mesoporous carbons were obtained as inverse replica of SBA-15, HMS and MCM-41 silica templates, with a large pore diameter (2-4 nm), a BET surface area of 1867, 874 and 910 m2g â1 respectively for CA_SBA-15_LPG_105, CA_HMS_LPG_80 and CA_MCM- 41_LPG_80 with bimodal pore size distribution (PSD) in the mesopores range. The results obtained show that mesoporous carbon with graphitic structures can be synthesized via the LPG route.
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InP-based photonic crystals : Processing, Material properties and Dispersion effectsBerrier, Audrey January 2008 (has links)
Photonic crystals (PhCs) are periodic dielectric structures that exhibit a photonic bandgap, i.e., a range of wavelength for which light propagation is forbidden. The special band structure related dispersion properties offer a realm of novel functionalities and interesting physical phenomena. PhCs have been manufactured using semiconductors and other material technologies. However, InP-based materials are the main choice for active devices at optical communication wavelengths. This thesis focuses on two-dimensional PhCs in the InP/GaInAsP/InP material system and addresses their fabrication technology and their physical properties covering both material issues and light propagation aspects. Ar/Cl2 chemically assisted ion beam etching was used to etch the photonic crystals. The etching characteristics including feature size dependent etching phenomena were experimentally determined and the underlying etching mechanisms are explained. For the etched PhC holes, aspect ratios around 20 were achieved, with a maximum etch depth of 5 microns for a hole diameter of 300 nm. Optical losses in photonic crystal devices were addressed both in terms of vertical confinement and hole shape and depth. The work also demonstrated that dry etching has a major impact on the properties of the photonic crystal material. The surface Fermi level at the etched hole sidewalls was found to be pinned at 0.12 eV below the conduction band minimum. This is shown to have important consequences on carrier transport. It is also found that, for an InGaAsP quantum well, the surface recombination velocity increases (non-linearly) by more than one order of magnitude as the etch duration is increased, providing evidence for accumulation of sidewall damage. A model based on sputtering theory is developed to qualitatively explain the development of damage. The physics of dispersive phenomena in PhC structures is investigated experimentally and theoretically. Negative refraction was experimentally demonstrated at optical wavelengths, and applied for light focusing. Fourier optics was used to experimentally explore the issue of coupling to Bloch modes inside the PhC slab and to experimentally determine the curvature of the band structure. Finally, dispersive phenomena were used in coupled-cavity waveguides to achieve a slow light regime with a group index of more than 180 and a group velocity dispersion up to 10^7 times that of a conventional fiber. / QC 20100712
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Präparation und Charakterisierung von TMR-Nanosäulen / Preparation and characterisation of TMR-NanopillarsHöwler, Marcel 27 August 2012 (has links) (PDF)
Diese Arbeit befasst sich mit der Nanostrukturierung von magnetischen Schichtsystemen mit Tunnelmagnetowiderstandseffekt (TMR-Effekt), welche in der Form von Nanosäulen in magnetoresistiven Speichern (MRAM) eingesetzt werden. Solche Nanosäulen können zukünftig ebenfalls als Nanoemitter von Mikrowellensignalen eine Rolle spielen. Dabei wird von der Auswahl eines geeigneten TMR-Schichtsystems mit einer MgO-Tunnelbarriere über die Präparation der Nanosäulen mit Seitenisolierung bis hin zum Aufbringen der elektrischen Zuleitungen eine komplette Prozesskette entwickelt und optimiert.
Die Strukturen werden mittels optischer Lithographie und Elektronenstrahllithographie definiert, die anschließende Strukturübertragung erfolgt durch Ionenstrahlätzen (teilweise reaktiv) sowie durch Lift-off. Rückmeldung über Erfolg oder Probleme bei der Strukturierung geben Transmissionselektronenmikroskopie (teilweise mit Zielpräparation per Ionenfeinstrahl, FIB), Rasterelektronenmikroskopie sowie die Lichtmikroskopie.
Es können so TMR-Nanosäulen mit minimalen Abmessungen von bis zu 69 nm x 71 nm hergestellt werden, von denen Nanosäulen mit Abmessungen von 65 nm x 87 nm grundlegend magneto-elektrisch charakterisiert worden sind. Dies umfasst die Bestimmung des TMR-Effektes und des Widerstandes der Tunnelbarriere (RA-Produkt). Weiterhin wurde das Verhalten der magnetischen Schichten bei größeren Magnetfeldern bis +-200mT sowie das Umschaltverhalten der magnetisch freien Schicht bei verändertem Winkel zwischen magnetischer Vorzugsachse des TMR-Elementes und dem äußeren Magnetfeld untersucht. Der Nachweis des Spin-Transfer-Torque Effektes an den präparierten TMR-Nanosäulen ist im Rahmen dieser Arbeit nicht gelungen, was mit dem zu hohen elektrischen Widerstand der verwendeten Tunnelbarriere erklärt werden kann. Mit dünneren Barrieren konnte der Widerstand gesenkt werden, allerdings führt ein Stromfluss durch diese Barrieren schnell zur Degradation der Barrieren. Weiterführende Arbeiten sollten das Ziel haben, niederohmige und gleichzeitig elektrisch belastbare Tunnelbarrieren in einem entsprechenden TMR-Schichtsystem abzuscheiden. Eine erste Auswahl an Ansatzpunkten dafür aus der Literatur wird im Ausblick gegeben. / This thesis deals with the fabrication of nanopillars with tunnel magnetoresistance effect (TMR-effect), which are used in magnetoresistive memory (MRAM) and may be used as nanooscillators for future near field communication devices. Starting with the selection of a suitable TMR-layer stack with MgO-tunnel barrier, the whole process chain covering the fabrication of the nanopillars, sidewall isolation and preparation of the supply lines on top is developed and optimised.
The structures are defined by optical and electron beam lithography, the subsequent patterning is done by ion beam etching (partially reactive) and lift-off. Techniques providing feedback on the nanofabrication are transmission electron microscopy (partially with target preparation by focused ion beam, FIB), scanning electron microscopy and optical microscopy.
In this way nanopillars with minimal dimensions reaching 69 nm x 71 nm could be fabricated, of which nanopillars with a size of 65 nm x 87 nm were characterized fundamentally with respect to their magnetic and electric properties. This covers the determination of the TMR-effect and the resistance of the tunnel barrier (RA-product). In addition, the behaviour of the magnetic layers under higher magnetic fields (up to +-200mT) and the switching behaviour of the free layer at different angles between the easy axis of the TMR-element and the external magnetic field were investigated. The spin transfer torque effect could not be detected in the fabricated nanopillars due to the high electrical resistance of the tunnel barriers which were used. The resistance could be lowered by using thinner barriers, but this led to a quick degradation of the barrier when a current was applied. Continuative work should focus on the preparation of tunnel barriers in an appropriate TMR-stack being low resistive and electrically robust at the same time. A first selection of concepts and ideas from the literature for this task is given in the outlook.
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