Microelectronics has enjoyed great success in the past century. As the technology node progresses, the complementary metal-oxide-semiconductor scaling has already reached a wall, and serious challenges in high-bandwidth interconnects and fast-speed signal processing arise. The incorporation of photonics to microelectronics provides potential solutions. The theme of this thesis is focused on the novel applications of travelling-wave microresonators such as microdisks and microrings for the on-chip optical interconnects and signal processing. Challenges arising from these applications including theoretical and experimental ones are addressed. On the theoretical aspect, a modified version of coupled mode theory is offered for the TM-polarization in high index contrast material systems. Through numerical comparisons, it is shown that our modified coupled mode theory is more accurate than all the existing ones. The coupling-induced phase responses are also studied, which is of critical importance to coupled-resonator structures. Different coupling structures are studied by a customized numerical code, revealing that the phase response of symmetric couplers with the symmetry about the wave propagating direction can be simply estimated while the one of asymmetric couplers is more complicated. Mode splitting and scattering loss, which are two important features commonly observed in the spectrum of high-Q microresonators, are also investigated. Our review of the existing analytical approaches shows that they have only achieved partial success. Especially, different models have been proposed for several distinct regimes and cannot be reconciled. In this thesis, a unified approach is developed for the general case to achieve a complete understanding of these two effects. On the experimental aspect, we first develop a new fabrication recipe with a focus on the accurate dimensional control and low-loss performance. HSQ is employed as the electron-beam resist, and the lithography and plasma etching steps are both optimized to achieve vertical and smooth sidewalls. A third-order temperature-insensitive coupled-resonator filter is designed and demonstrated in the silicon-on-insulator (SOI) platform, which serves as a critical building block element in terabit/s on-chip networks. Two design challenges, i.e., a broadband flat-band response and a temperature-insensitive design, are coherently addressed by employing the redundant bandwidth of the filter channel caused by the dispersion as thermal guard band. As a result, the filter can accommodate 21 WDM channels with a data rate up to 100 gigabit/s per wavelength channel, while providing a sufficient thermal guard band to tolerate more than ±15°C temperature fluctuations in the on-chip environment. In this thesis, high-Q microdisk resonators are also proposed to be used as low-loss delay lines for narrowband filters. Pulley coupling scheme is used to selectively couple to one of the radial modes of the microdisk and also to achieve a strong coupling. A first-order tunable narrowband filter based on the microdisk-based delay line is experimentally demonstrated in an SOI platform, which shows a tunable bandwidth from 4.1 GHz to 0.47 GHz with an overall size of 0.05 mm². Finally, to address the challenges for the resonator-based delay lines encountered in the SOI platform, we propose to vertically integrate silicon nitride to the SOI platform, which can potentially have significantly lower propagation loss and higher power handling capability. High-Q silicon nitride microresonators are demonstrated; especially, microresonators with a 16 million intrinsic Q and a moderate size of 240 µm radius are realized, which is one order of magnitude improvement compared to what can be achieved in the SOI platform using the same fabrication technology. We have also successfully grown silicon nitride on top of SOI and a good coupling has been achieved between the silicon nitride and the silicon layers.

Nanowires are high aspect ratio nanostructures with structural diameters on the order of nanometers to hundreds of nanometers. In this work, the optical properties of highly crystalline silicon nanowires grown by the Vapor-Liquid-Solid (VLS) method surrounded by a thin silicon shell are investigated for thin film solar cell applications. Crystalline core nanowires were surrounded by a conformal amorphous silicon shell and exhibited extremely high absorption of 95% at short wavelengths (??<550nm) and very low absorption of <2% at long wavelengths (??>780nm). Nanowires were disordered with average lengths ranging from 1.3 to 2.3 ??m. The absorption increased at longer wavelengths as a function of amorphous shell radial thickness, significantly higher than the absorption of a reference planar a-Si thin film. In addition, a new method to grow epitaxial silicon at low growth temperatures on glass substrates is demonstrated. Highly crystalline silicon nanowires with an average length of 800 nm were used as the seed crystal to grow an epitaxial silicon shell around, using a low temperature process. The nanowire core was grown at 400??C, and the shell was grown at about 150??C. Such epitaxial grown nanowire shells could be used as a building block for nanotechnology applications in which epitaxial silicon is required over large-area substrates such as glass. Furthermore, the epitaxial silicon shell nanowires exhibited absorption > 90% up to a wavelength of 600 nm, which was significantly higher than that of a planar 1 ??m nanocrystalline silicon film. The high absorption exhibited by nanowires with both amorphous and crystalline silicon shells makes them promising for use in photovoltaic and photodetector applications. Silicon nanowires were incorporated into thin film silicon n-i-p solar cells in two configurations: as a nanostructured back reflector, and in core-shell nanowire solar cells. First, domed-shaped nanostructures were fabricated by coating an array of silicon nanowires with a thick layer of amorphous silicon. After the nanostructures were coated with Ag and ZnO:Al, they were used as the backreflector in an n-i-p amorphous silicon solar cell. The nanostructured backreflector improved light scattering within the solar cell, leading to a short circuit current of 14.8mA/cm2, a 13% improvement over that of the planar device, which had a Jsc=13.1 mA/cm2. The overall conversion efficiency of nanostructured backreflector device was ?? = 8.87%, a strong improvement over that of the planar device (?? = 7.47%). Silicon nanowires were also incorporated into core-shell nanowire solar cells. The first device architecture investigated consisted of nanowires incorporated as the intrinsic absorption layer between a planar n+ layer and conformal p+ layer. However, the fabricated devices exhibited very low collection efficiencies of < 2% due to the presence of impurities incorporated by the catalyst used during nanowire growth. As a result, the device architecture was modified such that the nanowires provided high aspect ratio structure to enhance absorption in a shell material, but the nanowires themselves were not used as an active device component. Nanowire core-amorphous silicon shell solar cells, on average 525 nm long and about 350nm in total diameter, exhibited an impressive low total reflectance of <3% in the wavelength interval of 410 nm < ?? < 640nm and exceeded 10% only for ??>700 nm. As a result, the core-shell nanowire devices exhibited enhancement in quantum efficiency at low wavelengths, ?? < 500nm and high wavelengths, ?? > 600nm as compared to a planar device. The resulting short circuit current was 14.1 mA/cm2 compared to 12.3 mA/cm2 for the planar device, an improvement of ~15%. Nanowire core- nanocrystalline silicon shell solar cells were also fabricated using the same device architecture. Core-shell nanowires with an average length of 800 nm showed significant enhancement in quantum efficiency over all wavelengths as compared to a 1 ??m thick planar solar cell. The core-shell nanowire device had a short-circuit current of 16.2 mA/cm2 , a ~25% improvement over that of the planar thin film solar cell (Jsc=13.0 mA/cm2). Core-shell nanowire devices did, however, have lower open circuit voltage compared to the planar device. Non-conformal coverage was found to be a limiting factor in device performance, but further improvements can be expected with optimization of the n-i-p deposition conditions and nanowire density.

The need for miniaturized frequency-selective components in electronic systems is clear. The questions are whether and how micro-electro-mechanical systems (MEMS) can satisfy the need. This dissertation aims to address these questions from a scientific perspective. Silicon is the focus of this work, as it can benefit from scaling of the semiconductor industry. Silicon also offers many technical advantages. The characteristics of silicon resonators from 32 kHz to 1 GHz are described. The temperature stability and phase noise of a 6-MHz temperature-compensated oscillator and a 100-MHz temperature-controlled oscillator are reported. Silicon resonator design and characterization, with a focus on quality factor, linearity, and the electrical equivalent circuit, are included. Electrical tuning, electromechanical coupling, finite element modeling, and unexpected findings of these resonators are also described. A manufacturability technique employing batch process compensation is demonstrated. Results indicate that silicon is an excellent material for micromechanical resonators. The aim of this research is to explore the fundamental limitations, provide a foundation for future work, and also paint a clearer picture on how micromechanical resonators can complement alternative technologies.

Silicon photovoltaic (PV) is a promising solution for energy shortage and environmental pollution. We are experiencing an era when PV is exponentially increasing. Global cumulative installation had reached 380 GW in 2017. Among which, silicon-based PV productions share more than 90% market. Performance of the first two-generation commercial popular silicon solar cells - Al-BSF and PERC - are limited by metal/Si contacts, where interface defects significantly reduce the open-circuit voltage. In this context, full-area passivation concepts are proposed for c-Si solar cells, with expectation to enhance the efficiency via reducing carrier recombination loss at the contact regions. In this thesis, poly silicon on oxide (POLO) passivating contact is developed for high efficiency c-Si solar cells. We unveiled the working mechanisms of POLO cells and then optimized the device performance based on our conclusion. We use boiling nitric acid to oxidize c-Si surface, which is of significance to determine the POLO working mechanisms. Phosphorus and boron doped silicon films are deposited by plasma enhanced vapor deposition (PECVD) or low-pressure vapor deposition (LPCVD) followed by high temperature (>800°C) annealing. SiOx structural evolution process under different annealing temperature was observed and the corresponding effects on passivation have been elucidated. The carrier transport mechanisms in the POLO contact annealed at high temperature, e.g. 800°C  900°C, were explored. We unveil that carrier transport in POLO structure is a combination of tunneling and pinhole transport, but dominant at varied temperature regions. Phosphorus-doped n-type POLO contact is optimized by several parameters, such as doping concentration, film thickness, annealing temperature, film deposition temperature, film relaxation time during annealing process, etc. We successfully obtained minority carrier lifetime over 10ms and contact resistivity lower than 30 mΩ·cm2. Boron-doped p-type POLO contact is also optimized by changing the doping concentration and annealing temperature. Finally, further hydrogen passivation is applied to enhance p-type POLO contact passivation, achieving an iVoc>690 mV, J0 <5 fA/cm2 and contact resistivity 1.3 mΩ·cm2. With the optimized n-type and p-type POLO contacts, an efficiency over 18% is achieved on n-type c-Si solar cells with a flat front surface.

京都大学 / 0048 / 新制・課程博士 / 博士(工学) / 甲第20001号 / 工博第4245号 / 新制||工||1657(附属図書館) / 33097 / 京都大学大学院工学研究科物質エネルギー化学専攻 / (主査)教授 作花 哲夫, 教授 安部 武志, 教授 邑瀬 邦明 / 学位規則第4条第1項該当 / Doctor of Philosophy (Engineering) / Kyoto University / DGAM

In this thesis, group IV material oxides for silicon photonics applications were deposited using novel deposition techniques. Erbium and terbium doped silicon oxide thin films were deposited through a novel hybrid radio frequency (RF) magnetron sputtering source in an electron cyclotron resonance (ECR)-plasma enhanced chemical vapour deposition (PECVD) reactor chamber. This approach contrasts with traditional doping methods which use metal-organic precursors to introduce rare-earth dopant species into the host matrix. The effects of sputtering power applied to the rare-earth target and system plasma pressure on the thin film properties were investigated. It was found that the sputtering power strongly influences the rare-earth incorporation, and a wide range of control over the doping level can be achieved. The effect of sputtering power on the refractive index, stoichiometry, and film density were also investigated. Doped thin films deposited with this technique showed low as-deposited hydrogen concentrations. In the case of terbium doped silicon oxide (SiOx), photoluminescence (PL) studies were conducted finding bright emission due to 5D4 → 7F5 transitions visible with the naked eye in films annealed above 1150 °C. Further investigation found that silicon nanostructures formed at the high annealing temperatures and were likely sensitizing the Tb3+ ions. These results demonstrate that hybrid sputtering in ECR-PECVD can be an effective tool for integrating optically active rare-earth dopants into silicon-based thin films. Using alternating current (AC) plasma assisted reactive magnetron sputtering (PARMS), low optical loss germanium oxide (GeO2) thin films were also produced. The films were fabricated at low temperature and high deposition rates of 6–38 nm/min on silicon and thermally oxidized silicon substrates. Prism coupling measurements demonstrated losses of 0.1 dB/cm at wavelengths ranging from 638 to 980 nm attributed to good uniformity and low surface roughness demonstrated through atomic force microscopy (AFM) measurements. The thin films materials developed here are highly promising for their applications in silicon photonics devices, including light sources and amplifiers. / Thesis / Candidate in Philosophy

No description available.

This research introduces tellurium oxide (TeO2) glass doped with optically active erbium ions (Er3+) as an active oxide cladding material for silicon-on-insulator (SOI) waveguides for realization of a silicon-based erbium-doped waveguide amplifier (EDWA) for integrated optics. Optical amplification of this nature is enabled by energy transitions, such as stimulated absorption and emission, within the shielded 4f shell of the rare-earth atomic structure caused by excitation from photons incident on the system. Er3+ ions are doped into the TeO2 film during deposition onto the SOI waveguides using a reactive magnetron co-sputtering system operated by McMaster’s Centre for Emerging Device Technologies (CEDT). Prior to fabrication, the waveguides are designed using photonic CAD software packages, for optimization of the modal behaviour in the device, and Matlab, for characterization of the optical gain performance through numerical analysis of the rate and propagation equations of the Er3+-based energy system. Post fabrication, the waveguide loss and gain of the coated devices are experimentally measured. The fabricated waveguide amplifier produces a peak signal enhancement of 3.84 dB at 1533 nm wavelength for a 1.7 cm-long waveguide device. High measured waveguide losses (> 10 dB/cm) produce a negative internal net gain per unit length. However, the demonstration and implementation of an active rare-earth doped cladding material on a silicon waveguide is successful, which is a major step in developing integrated optical amplifiers for conventional silicon photonics platforms. / Thesis / Master of Applied Science (MASc)

This dissertation reports very novel solutions for the trimming and compensation of various parameters of silicon micromechanical resonators and resonator-arrays. Post-fabrication trimming of resonance frequency to a target value is facilitated by diffusing in a deposited thin metal layer into a Joule-heated silicon resonator. Up to ~400 kHz of trimming-up and trimming-down in a 100 MHz Silicon Bulk Acoustic Resonators (SiBARs) are demonstrated via gold and aluminum diffusion respectively. The dependence of the trimming range on the duration of Joule heating and value of current passed are presented and the possibility of extending the trimming range up to ~4 MHz is demonstrated. Passive temperature compensation techniques are developed to drastically reduce the temperature coefficient of frequency (TCF) of silicon resonators. The dependence of TCF on the charge carriers in silicon are extensively studied and exploited for the very first time to achieve temperature compensation. A charge surplus via degenerate doping using boron and aluminum is shown to reduce a starting TCF of -30 ppm/°C to -1.5 ppm/°C while a charge depletion effected by creating multiple pn-junctions reduces the TCF to -3 ppm/°C. Further, shear acoustic waves in silicon microresonators have also been identified to effect a TCF reduction and have been excited in a concave SiBAR (or CBAR) to exhibit a TCF that is 15 ppm/°C lesser than that of a conventional rectangular SiBAR. The study on quality factor (Q) sensitivity to the various crystallographic axis of transduction in silicon resonators show that the non-repeatability of Q across various fabrication batches are due to the minor angular misalignment of ≤ 0.5° during the photolithography processes. Preferred axes of transduction for minimal misalignment sensitivity are identified and novel low-loss resonator-array type performances are also reported from a single resonator while transduced along certain specific crystallographic axes. Details are presented on an unprecedented new technique to create and fill charge traps on the silicon resonator which allows the operation of the capacitive SiBARs without the application of any polarization voltages (Vp) for the first time, making them very attractive candidates for ultra-low-power oscillator and sensor applications. Finally, a fabrication process that integrates both the capacitive and piezoelectric actuation/sensing schemes in microresonators is developed and is shown to compensate for the parasitics in capacitive silicon resonators while maintaining their high-Q.

The fabrication of low cost, high efficiency solar cells is imperative in competing with existing energy technologies. Many research groups have explored using III-V materials and thin-film technologies to create high efficiency cells; however, the materials and manufacturing processes are very costly as compared to monocrystalline silicon (Si) solar cells. Since commercial Si solar cells typically have efficiencies in the range of 17-19%, techniques such as surface texturing, depositing a surface-passivating film, and creating multi-junction Si cells are used to improve the efficiency without significantly increasing the manufacturing costs. This research focused on two of these techniques: (1) a tandem junction solar cell comprised of a thin-film perovskite top cell and a wafer-based Si bottom cell, and (2) Si solar cells with single- and double-layer silicon nitride (SiNx) anti-reflection coatings (ARC). The perovskite/Si tandem junction cell was modeled using a Matlab analytical program. The model took in material properties such as doping concentrations, diffusion coefficients, and band gap energy and calculated the photocurrents, voltages, and efficiencies of the cells individually and in the tandem configuration. A planar Si bottom cell, a cell with a SiNx coating, or a nanostructured black silicon (bSi) cell can be modeled in either an n-terminal or series-connected configuration with the perovskite top cell. By optimizing the bottom and top cell parameters, a tandem cell with an efficiency of 31.78% was reached. Next, planar Si solar cells were fabricated, and the effects of single- and double-layer SiNx films deposited on the cells were explored. Silicon nitride was sputtered onto planar Si samples, and the refractive index and thicknesses of the films were measured using ellipsometry. A range of refractive indices can be reached by adjusting the gas flow rate ratios of nitrogen (N2) and argon (Ar) in the system. The refractive index and thickness of the film affect where the minimum of the reflection curve is located. For Si, the optimum refractive index of a single-layer passivation film is 1.85 with a thickness of 80nm so that the minimum reflection is at 600nm, which is where the photon flux is maximized. However, using a double-layer film of SiNx, the Si solar cell performance is further improved due to surface passivation and lowered surface reflectivity. A bottom layer film with a higher refractive index passivates the Si cell and reduces surface reflectivity, while the top layer film with a smaller refractive index further reduces the surface reflectivity. The refractive indices and thicknesses of the double-layer films were varied, and current-voltage (IV) and external quantum efficiency (EQE) measurements were taken. The double-layer films resulted in an absolute value increase in efficiency of up to 1.8%.