No description available.

[pt] Substratos de germânio (Ge) são utilizados para o crescimento de dispositivos optoeletrônicos III-V, como células solares. Porém, o Ge é uma matéria-prima crítica devido à sua disponibilidade limitada. Além disso, o substrato de Ge representa cerca de 30-40 por cento dos custos totais de uma célula solar de junção tripla. Neste trabalho, foram crescidas amostras e células solares III-V sobre substratos de Ge com diferentes tecnologias (tec). Três diferentes tecs foram investigadas: 1) utilizando substratos de Ge com camadas porosas para crescer materiais III-V, sendo que a camada porosa é retirada para que o substrato possa ser reutilizado; 2) utilizando substratos mais finos e com menos processos de finalização da superfície, o que a deixa mais rugosa comparada a substratos comerciais; 3) substituindo o substrato de Ge por substratos alternativos que compreendam outros elementos, como um substrato de Si onde é depositado um buffer metamórfico de SiGe, no qual o parâmetro de rede foi ajustado até o chegar no de Si0.1Ge0.9. Os substratos utilizados não são perfeitos como os substratos comerciais de Ge e podem gerar defeitos nas camadas de III-V subsequentes. Para investigar a influência desses substratos nas camadas III-V foram crescidas heteroestruturas duplas (HED) de AlGaInAs/GaInAs nos substratos das tecs 1 e 2 e HED de AlGaAs/GaAs nos substratos da tec 3. Suas propriedades foram avaliadas com AFM para obter a rugosidade média quadrática e possíveis defeitos da superfície, catodoluminescência para estimar a densidade de defeitos na estrutura e Electron Channeling Contrast Imaging para identificar os tipos de defeitos encontrados com CL. Além disso, para as amostras crescidas sobre os substratos tec 1, suas composições e espessuras foram investigadas por XRD e com fotoluminescência resolvida no tempo avaliou-se o tempo de vida dos elétrons. Nos substratos das tecs 2 e 3 também foram crescidas células solares de junção tripla, que foram processadas e caracterizadas por curvas I-V e EQE. Os resultados obtidos com todas as tecs levam a uma perspectiva otimista para um futuro com células solares mais baratas e que utilizem menos Ge. / [en] Germanium (Ge) substrates are used for the growth of III-V optoelectronic devices such as solar cells. However, Ge is a critical raw material due to its limited availability. Furthermore, Ge substrate accounts for about 30-40 percent of the total costs of a triple junction solar cell. In this work III-V samples and solar cells were grown on Ge substrates with different technologies (techs). Three different techs were investigated: 1) using Ge substrates with porous layers to grow III-V materials, in which the porous layer is removed so that the substrate can be reused; 2) using thinner substrates and with fewer surface finishing processes, which makes it rougher compared to commercial substrates; 3) replacing the Ge substrate with alternative substrates that comprise other elements, such as a Si substrate where a metamorphic SiGe buffer is deposited, in which the lattice parameter is gradually adjusted until it reaches Si0.1 Ge0.9. The substrates used are not as perfect as commercial Ge substrates and can generate defects in the subsequent III-V layers. To investigate the influence of these substrates on III-V layers, double heterostructures (DH) of AlGaInAs/GaInAs were grown on the substrates of techs 1 and 2 and DH of AlGaAs/GaAs on the substrates of tech 3. Their properties were evaluated with AFM to obtain the root mean square roughness and possible surface defects, cathodoluminescence to estimate the density of defects in the structure and Electron Channeling Contrast Imaging to identify the types of defects found with CL. Furthermore, for samples grown on tech 1 substrates, the compositions and thicknesses were evaluated by XRD, and with time-resolved photoluminescence, the lifetime of the electrons was evaluated. Triple junction solar cells were also grown on techs 2 and 3 substrates, which were processed and characterized by I-V and EQE curves. The results obtained with all tecs lead to an optimistic perspective for a future with cheaper solar cells that use less Ge.

No description available.

Le sujet de thèse s’inscrit dans le cadre des stratégies visant à organiser des nanostructures, plus particulièrement les stratégies visant à augmenté la densité d’information dans les médias magnétique. Les techniques de synthèse en chimie douce utilisés au LPCNO-INSA on permet d’élaborer des nano-bâtonnets monocristallins de cobalt dont les propriétés ferromagnétiques en termes d’anisotropie et d’aimantation présentent un grand intérêt pour des applications dans le domaine du stockage magnétique. La maitrise de la croissance de ces nano-bâtonnets de Co organisés perpendiculairement sur un substrat peut permettre de réaliser un média de forte densité. Nous avons dans un premier temps vérifié la croissance perpendiculaire de nano bâtonnets de cobalt monocristallins sur une couche continue de Pt (111) épitaxiée sur un substrat de saphir (Al2O3) et montré que cette combinaison de deux types de dépôts (physique et chimique) donne effectivement lieu à un réseau dense et perpendiculaire de bâtonnets de Co. Pour but d’organiser cette croissance et découpler physiquement les bâtonnets de Co nous avons alors étudié la croissance de ces bâtonnets de Co sur des îlots 3D métalliques de Pt et de Co.En première partie nous avons étudié la structure cristalline, La morphologie, les distributions en taille et l’état des contraintes des îlots de Pt et Co déposée sur la surface (0001) du saphir et la surface (001) du MgO par pulvérisation cathodique. Et en deuxième partie, nous avons étudié la croissance des nano bâtonnets de Co sur les ilots de Pt et de Co maitrisés dans l’étape précédente / The subject of this thesis is to be part of strategies in order to organize nanostructures, particularly strategies to increase information density in magnetic media. The synthesis techniques used in chemistry (LPCNO-INSA laboratory) is allowed to develop monocrystalline nanorods of cobalt whose ferromagnetic properties in terms of anisotropy and magnetization present a great interest for applications in the field of magnetic storage. The success in controling the growth of these nanorods arranged perpendicularly on a substrate can lead to achieve a high density media. We tested the perpendicular growth of monocrystalline nanorods of cobalt on a continuous and epitaxial layer of Pt (111) grown on a substrate of sapphire (Al2O3) and showed that this combination of two types of deposits (physical and chemical) give actually a dense and perpendicular network of Co nanorods. In the aim to organizing this growth and decoupling physically the nanorods we studied the growth of these Co nanorods on 3D metallic islands of Pt and Co. In the first part we studied the crystal structure, morphology, size distributions and the stress state of Pt and Co islands deposited on the surface (0001) of sapphire and (001) surface of MgO by sputtering. And in the second part, we studied the growth of Co nanorods on a Pt and Co islands mastered in the previous step

Cette thèse concerne une nouvelle méthode chimique de croissance par germes qui peut produire des assemblés de nanostructures métalliques epitaxiées sur des surfaces macroscopiques cristallines qui agissent comme germes. Cette approche permet d’obtenir des assemblés bien organisées en échelle centimétrique de nanofils métalliques de Co, qui sontmonocristallins, monodisperses de diamètres inferieurs à 10nm et qui ont une orientation perpendiculaire. Ils ont une anisotropie magnétique perpendiculaire et sont intéressantes pour des applications d’enregistrement magnétique à très haute densité. L’extension de cette méthode au fer donne des films nanostructurés de fer. L’orientation des nanostructures sur le support solide dépend de l’orientation cristallographique du substrat, alors que leur morphologie est dictée par la composition de la solution. Cet objectif a été atteint grâce à des études parallèles sur le mécanisme de croissance de nano-cristaux de cobalt en solution qui ont révélées une influence inattendue de la procédure de préparation de la solution mère sur la morphologie des nanocristaux. En plus,l’utilisation des germes nanoscopiques pour la croissance de Co et de Fe a rendu des nanofils longs de Co et des altères de Co-Fe et elle a contribué à la définition et l’amélioration des conditions expérimentales pour la croissance par germes de Co et de Fe sur les substrats solides. / This thesis concerns a new wet chemical seeded growth method that can produce arrays of metal nanostructures epitaxially grown on crystalline macroscopic surfaces which act as seeds. This approach produces wafer-scale organized 2D hexagonal arrays of perpendicularly oriented, monodisperse and monocrystalline metallic Co nanowires with diameters below 10 nm which exhibit perpendicular magnetic anisotropy and are interesting for applications in ultra high density magnetic recording. Extension of this approach to iron gives rise to nanostructured iron films. The orientation of the nanostructures on the solid substrate depends on the substrate crystallographic orientation, whereas their morphology is dictated by the solution composition. This objective was attained through parallel studies on the growth mechanism of cobalt nano-crystals in solution which revealed an unexpected influence of the stock solution preparation procedure on the nanocrystal morphology. In addition, the use of nanoscopicseeds for the overgrowth of cobalt and iron gave rise to long Co nanowires and Co-Fe dumbbells and contributed to the definition and the improvement of the experimental conditions for the seeded growth of Co and Fe on the solid substrates

Les travaux élaborés dans cette thèse ont pour objectif de caractériser les propriétés magnétiques et structurales de nanostructures magnétiques obtenues par une nouvelle méthode de synthèse mixte physique/chimique, dite croissance hybride. La première partie du travail réalisé consiste en l’élaboration de films minces métalliques sur substrats par pulvérisation cathodique. Sur ces films minces, la synthèse chimique par voie organométallique aboutit à des réseaux de nanofils de Co monocristallins hcp, ultra-denses, ou des films nanostructurés de Fe. Les observations MEB/MET et les mesures de diffraction de rayons X réalisées sur les substrats montrent le fort impact induit par la cristallinité de la couche mince sur la morphologie et la direction de croissance des nanostructures magnétiques.Les mesures magnétiques réalisées sur des réseaux de nanofils de Co montrent une forte anisotropie magnétique perpendiculaire au substrat. Cela est obtenu grâce à l’anisotropie magnétocristalline du Co hcp (avec l’axe c parallèle à l’axe du fil) qui s’ajoute à l’anisotropie de forme. L’aimantation thermiquement stable, semble suivre un régime de retournement cohérent, régime non observé dans les structures polycristallines. L’organisation de ces nanostructures, leur grande densité et la stabilité de leur aimantation font de ce réseau un bon candidat aux applications de médias d’enregistrement magnétique à forte densité. / The elaboration of this thesis aims to characterize the magnetic and structural properties of magnetic nanostructures obtained by a new mixed physical / chemical synthesis method, called hybrid growth. The first part of the work consists in the development of thin metal films on substrates by cathode sputtering. Furthermore, the chemical synthesis conducted by organometallic chemistry on those thin films, results in an array of ultra-dense Co monocristallins hcp nanowires, or nanostructured Fe films. Additionally, The SEM/TEM observations and the X-ray diffraction measurements conducted on the substrates and induced by the crystlalline structure of the thin film, show the high impact on the magnetic nanostructures morphology and growth direction.Moreover, the magnetic measurements executed on the Co nanowires array show a strong magnetic anisotropy perpendicular to the substrate. This observation is obtained due to the magnetocrystalline anisotropy acting along the nanowire axis (Co hcp structure with the c axis parallel to the nanowire axis) in the same direction of the nanowires shape anisotropy. The magnetization within these structures is thermally stable. It follows a coherent magnetization reversal mode that has not been observed in the polycrystalline structures up to now. Finally, the self-organization of the nanowires as well as their high density and stable magnetization nominate this system for their application in high density magnetic storage devices.

Die vorliegende Arbeit behandelt die Charakterisierung von epitaktischem Graphen auf Siliziumkarbid (0001) mittels Raman-Spektroskopie. Nach der Einführung theoretischer sowie experimenteller Grundlagen werden das Wachstum von Graphen auf Siliziumkarbid (SiC) behandelt und die untersuchten Materialsysteme vorgestellt. Es wird gezeigt, dass das Raman-Spektrum von epitaktischem Graphen auf SiC (0001) neben den Phononenmoden des Graphens und des Substrats weitere Signale beinhaltet, welche der intrinsischen Grenzflächenschicht, dem Buffer-Layer, zwischen Graphen und SiC zugeordnet werden können. Das Raman-Spektrum dieser Grenzflächenschicht kann als Abbild der phononischen Zustandsdichte interpretiert werden. Fortführend werden verspannungsinduzierte Änderungen der Phononenenergien der G- und 2D-Linie im Raman-Spektrum von Graphen untersucht. Dabei werden starke Variationen des Verspannungszustands beobachtet, welche mit der Topographie der SiC-Oberfläche korreliert werden können und erlauben, Rückschlüsse auf Wachstumsmechanismen zu ziehen. Die Entwicklung einer neuen Messmethode, bei der das Raman-Spektrum von Graphen durch das SiC-Substrat aufgenommen wird, ermöglicht die detektierte Raman-Intensität um über eine Größenordnung zu erhöhen. Damit wird die Raman-spektroskopische Charakterisierung eines Graphen-Feldeffekttransistors mit top gate ermöglicht und ein umfassendes Bild des Einflusses der Ladungsträgerkonzentration und der Verspannung auf die Positionen der G- und 2D-Raman-Linien von quasifreistehendem Graphen auf SiC erarbeitet.

The present work has been focused on the growth of Group III-nitride epitaxial layers and nanostructures on Si (111) substrates by plasma-assisted molecular beam epitaxy. Silicon is regarded as a promising substrate for III-nitrides, since it is available in large quantity, at low cost and compatible to microelectronics device processing. However, three-dimensional island growth is unavoidable for the direct growth of GaN on Si (111) because of the extreme lattice and thermal expansion coefficient mismatch. To overcome these difficulties, by introducing β-Si3N4 buffer layer, the yellow luminescence free GaN can be grow on Si (111) substrate. The overall research work carried out in the present study comprises of five main parts. In the first part, high quality, crack free and smooth surface of GaN and InN epilayers were grown on Si(111) substrate using the substrate nitridation process. Crystalline quality and surface roughness of the GaN and InN layers are extremely sensitive to nitridation conditions such as nitridation temperature and time. Raman and PL studies indicate that the GaN film obtained by the nitridation sequences has less tensile stress and optically good. The optical band gaps of InN are obtained between ~0.73 to 0.78 eV and the blueshift of absorption edge can be induced by background electron concentration. The higher electron concentration brings in the larger blueshift, due to a possible Burstein–Moss effect. InN epilayers were also grown on GaN/Si(111) substrate by varying the growth parameters such as indium flux, substrate temperature and RF power. In the second part, InGaN/Si, GaN/Si3N4/n-Si and InN/Si3N4/n-Si heterostructures were fabricated and temperature dependent electrical transport behaviors were studied. Current density-voltage plots (J-V-T) of InGaN/Si heterostructure revealed that the ideality factor and Schottky barrier height are temperature dependent and the incorrect values of the Richardson’s constant produced, suggests an inhomogeneous barrier at the heterostructure interface. The higher value of the ideality factor compared to the ideal value and its temperature dependence suggest that the current transport is primarily dominated by thermionic field emission rather than thermionic emission. The valence band offset of GaN/β-Si3N4/Si and InGaN/Si heterojunctions were determined by X-ray photoemission spectroscopy. InN QDs on Si(111) substrate by droplet epitaxy and S-K growth method were grown in the third part. Single-crystalline structure of InN QDs (droplet epitaxy) was verified by TEM and the chemical bonding configurations of InN QDs were examined by XPS. The interdigitated electrode pattern was created and (I-V) characteristics of InN QDs were studied in a metal–semiconductor–metal configuration in the temperature range of 80–300 K. The I-V characteristics of lateral grown InN QDs were explained by using the trap model. A systematic manipulation of the morphology, optical emission and structural properties of InN/Si (111) QDs (S-K method) is demonstrated by changing the growth kinetics parameters such as flux rate and growth time. The growth kinetics of the QDs has been studied through the scaling method and observed that the distribution of dot sizes, for samples grown under varying conditions, has followed the scaling function. In the fourth part, InN nanorods (NRs) were grown on Si(111) and current transport properties of NRs/Si heterojunctions were studied. The rapid rise and decay of infrared on/off characteristics of InN NRs/Si heterojunction indicate that the device is highly sensitive to the IR light. Self-aligned GaN nanodots were grown on semi-insulating Si(111) substrate. The interdigitated electrode pattern was created on nanodots using photolithography and dark as well as UV photocurrent were studied. Surface band gaps of InN QDs were estimated from scanning tunneling spectroscopy (STS) I-V curves in the last part. It is found that band gap is strongly dependent on the size of InN QDs. The observed size-dependent STS band gap energy blueshifts as the QD’s diameter or height was reduced.

This dissertation works out the vibrational properties of epitaxial silicene, which was discovered by Vogt et al. in 2012 by the epitaxial synthesis on the silver substrate. Its two-dimensional (2D) character is modified in comparison to the free-standing silicene due to its epitaxial nature, since the underlying substrate alters the physical properties of silicene as a result of the strong hybridization of the electronic levels of the substrate and adlayer. The growth of silicene layers is complicated by the sensitivity of the Si structures to the experimental conditions, mainly temperature, resulting in the formation of several seemingly different surface reconstructions. Another Si structure appears on the Ag surface at a supramonolayer coverage. The Raman spectroscopy was utilized to understand the relation between different Si structures and reveal their origin as well as to investigate the phonon-related physical properties of two-dimensional Si sheets. The central core of this work is the growth and characterization of these 2D silicene monolayers on the Ag (111) surface as well as the formation of silicene multilayer structures. The characterization of these materials was performed using in situ surface-sensitive measurement methods such as Raman spectroscopy and low-energy electron diffraction under ultra-high vacuum conditions due to high chemical reactivity of epitaxial silicene. Additional characterization was done ex situ by means of scanning force microscopy. The experimentally determined spectral signature of the prototypical epitaxial (3x3)/(4x4) silicene structure was confirmed by ab initio calculations, in collaboration with theory groups. The Raman signatures of the other 2D and 3D Si phases on Ag (111) were determined which allowed us to provide a clear picture of their formation depending on the preparation conditions. The monitoring of the silicene multi-layer growth yielded the vibrational signature of the top layer, reconstructed in a (√3x√3) fashion. It was compared to the inverse, (√3x√3)-Ag/Si(111), system showing the vast amount of similarities, which suggest that the (√3x√3) reconstruction belong to the silver layer. The chemical and physical properties of this surface structure additionally strengthen this equivalence. The possibility of functionalization of epitaxial silicene was demonstrated via exposure to the atomic hydrogen under UHV conditions. The adsorbed hydrogen covalently bonds to the silicene lattice modifying it and reducing its symmetry. As shown by Raman spectroscopy, such modification can be reversed by thermal desorption of hydrogen. The excitation-dependent Raman measurements also suggest the change of the electronic properties of epitaxial silicene upon hydrogenation suggesting that its originally semi-metallic character is modified into a semiconducting one. / Die experimentellen Forschungsarbeiten zum Thema Silicen basieren auf den 2012 von Vogt et al. durchgeführten Untersuchungen zu dessen Synthese auf Silbersubstraten. Diese Untersuchungen lieferten die Grundlage, auf der zweidimensionales (2D) epitaktisches Silicen sowie weitere 2D Materialien untersucht werden konnten. In den anfänglichen Arbeiten konnte dabei gezeigt werden, dass sich die Eigenschaften von epitaktischem Silicen gegenüber den theoretischen Vorhersagen von frei-stehendem Silicen unterscheiden. Darüber hinaus verkomplizieren sich die experimentellen Untersuchungen dieses 2D Materials, da auf dem Ag(111) Wachstumssubstrat sechs verschiedene 2D Si Polytypen existieren. Eine detaillierte Darstellung dieser Untersuchungen findet sich in dem einführenden Kapitel der vorliegen Promotionsschrift. Der zentrale Kern dieser Arbeit beschäftigt sich mit dem Wachstum und der Charakterisierung dieser 2D Silicen Monolagen auf Ag(111) Oberflächen sowie der Bildung von Silicen- Multilagen Strukturen. Die Charakterisierung dieser Materialien wurde in situ mit oberflächenempfindlichen Messmethoden wie der Raman Spektroskopie und der niederenergetischen Elektronenbeugung unter Ultrahochvakuum-Bedingungen durchgeführt. Eine zusätzliche Charakterisierung erfolgte ex situ mittels Raster-KraftMikroskopie. Die experimentell bestimmte spektrale Raman-Signatur der prototypischen epitaktischen (3x3)/(4x4) Silicene Struktur wurde durch ab initio Rechnungen, in Zusammenarbeit mit Theoriegruppen, bestätigt. Durch diesen Vergleich wir die zweidimensionale Natur der epitaktischen Silicen-Schichten vollständig bestätigt, wodurch andere mögliche Interpretationen ausgeschlossen werden können. Darüber hinaus wurden die Ramans-Signaturen der weiteren 2D und 3D Siliziumphasen auf Ag(111) bestimmt, wodurch sich ein klares Bild der Bildung dieser Strukturen in Abhängigkeit von den Präparationsbedingungen ergibt. Um die Möglichkeit der Funktionalisierung von Silicen und der weiteren 2D Si Strukturen zu testen, wurden diese unter UHV Bedingungen atomarem Wasserstoff ausgesetzt. Durch die Bindung zu den Wasserstoffamen wird die kristalline Struktur der Silicen-Schichten modifiziert und die Symmetrie reduziert, was sich deutlich in der spektralen Raman-Signatur zeigt. Wie mittels Raman Spektroskopie gezeigt werden konnte, kann diese Modifikation durch thermische Desorption des Wasserstoffs rückgängig gemacht werden, ist also reversibel. Raman Messungen mit verschiedenen Anregungswellenlängen deuten darüber hinaus auf die Änderung der elektronischen Eigenschaften der Silicen-Schichten durch die Hydrierung hin. Der ursprüngliche halbmetallische Charakter der epitaktischen Silicen-Schicht geht möglicherweise in einen halbleitenden Zustand über. Das Wachstum von Silicen Multilagen wurde ebenfalls mit in situ Ramanspektroskopie verfolgt. Die sich dabei ergebene Raman-Signatur wurde mit der Raman-Signatur von Ag terminiertem Si(111) verglichen. Hier zeigen sich große Ähnlichkeiten, die auf eine ähnliche atomare Struktur hindeuten und zeigen, dass Ag Atome für die Ausbildung der Oberflächenstruktur während des Wachstums der Si-Lagen verantwortlich sind. Die chemischen und physikalischen Eigenschaften dieser Struktur bestärken zusätzlich diese Äquivalenz.

Einzelschichten von Graphen-Nanobänders (GNRs) wurden auf SiC(0001)-Substraten mit zwei unterschiedlichen Fehlschnitten bei Temperaturen von 1410 bis 1460 °C synthetisiert. Das GNR-Wachstum lässt sich bei niedriger Stufenkantenhöhe am besten durch eine exponentielle Wachstumsrate, welche mit der Energiebarriere für die Ausdiffusion von Si korreliert ist. Anderseits wird bei Substraten mit höheren Stufenkanten eine nicht-exponentielle Rate beobachtet, was mit der Bildung von mehrlagigen Graphen an den Stufenkanten in Verbindung gebracht wird. Die Sauerstoffinterkalation von epitaktischen GNRs mittels Ausglühen an Luft von Bändern wird als nächstes untersucht, welche auf unterschiedlichen SiC-Substraten gewachsen wurden. Neben der Umwandlung von monolagigem zu zweilagigem Graphen in der Nähe der Stufenkanten von SiC, führt die Sauerstoffinterkalation zusätzlich zu der Bildung einer Oxidschicht auf den Terrassen des Substrats, was die zweilagigen GNRs elektrisch isoliert voneinander zurücklässt. Die elektrische Charakterisierung der zweilagigen GNRs zeigten dass die Bänder durch die Behandlung mit Sauerstoff elektrisch voneinander entkoppelt sind. Eine robuste Lochkonzentration von etwa 1x10¹³ cm-² und Mobilitäten von bis zu 700 cm²/(Vs) wurden für die GNRs mit einer typischen Breite von 100 nm bei Raumtemperatur gemessen. Wohl definierte Mesastrukturen gebildet mittels Elektronenstrahllithographie auf SiC-Substraten, wurde zuletzt untersucht. Die Charakterisierung des Ladungsträgertransports von GNRs die auf den Seitenwänden der strukturierten Terrassen gewachsen wurden, zeigt eine Mobilität im Bereich von 1000 bis 2000 cm²/(Vs), welche für verschiedene Strukturen auf der gesamten Probe homogen ist, was die Reproduzierbarkeit dieses Herstellungsverfahrens hervorhebt, sowie dessen Potential für die Implementierung in zukünftigen Technologien, welche auf epitaktischgewachsenene GNRs basieren. / Monolayer graphene nanoribbons (GNRs) were synthesized on SiC(0001) substrates with two different miscut angles at temperatures ranging from 1410 to 1460 °C. The GNR growth in lower step heights is best described by an exponential growth rate, which is correlated with the energy barrier for Si out-diffusion. On the other hand, a non-exponential rate is observed for substrates with higher steps, which is associated with the formation of few-layer graphene on the step edges. Oxygen intercalation of epitaxial GNRs is investigated next by air annealing ribbons grown in different SiC(0001) substrates. Besides the conversion of monolayer into bilayer graphene near the step edges of SiC, the oxygen intercalation also leads to the formation of an oxide layer on the terraces of the substrate, leaving the bilayer GNRs electronically isolated from each other. Electrical characterization of bilayer GNRs reveals that the ribbons are electrically decoupled from the substrate by the oxygen treatment. A robust hole concentration of around 1x10¹³ cm-² and mobilities up to 700 cm²/(Vs) at room temperature are measured for GNRs whose typical width is 100 nm. Well defined mesa structures patterned by electron beam lithography on the surface of SiC substrates is lastly researched. Transport characterization of GNRs grown on the sidewalls of the patterned terraces shows a mobility in the range of 1000 – 2000 cm²/(Vs), which is homogeneous for various structures throughout the sample, indicating the reproducibility of this fabrication method and its potential for implementation in future technologies based on epitaxially grown GNRs.